The world’s largest event dedicated to the educational, technical, and scientific advancement of ultraviolet (UV) and electron beam (EB) technologies.

CONFERENCE PROGRAM :: Monday, May 19

7:00 – 7:45 AM

Introduction to the Basics of UV/EB Curing*

Dr. Mike J. Idacavage, Radical Curing, LLC

*Open to all attendees

8:00 – 10:00 AM
10:00 – 12:00 PM – BREAK & EXHIBITS GRAND OPENING
12:00 – 1:00 PM
1:00 – 3:00 PM – LUNCHEON
3:00 – 5:00 PM

3D: New Product Debut 1

AEROSIL® fumed silica as functional additive in 3D printing photo resin

Christian Bykovets, Evonik

New Products from EIT 2.0 LLC

Jim Raymont, EIT 2.0 LLC

BYK PFAS-free Micronized Wax Options for Superior Surface Enhancements in 100% UV

Mike Toth, BYK USA, Inc.

Photomer® 4184 U: Versatile Monofunctional Urethane Acrylate for High-Performance UV-Curable Solutions

Lizeth Mendez, IGM Resins USA Inc.

New Products and Technical Capabilities

Barbara Varone and Alex Mejiritski, Kowa American Corp

TotalSDS Author™: Simplifying SDS Compliance for UV & EB Innovations

Alex Milan, Veronica Marrero, TotalSDS

Sustainable Chemistry in Action: Bio-Based Oligomers for Industrial UV-Coatings

Franziska Trapp, hubergroup

TBD

Ryan Turner, GEW (EC) Limited

5:00 – 6:00 PM – RECEPTION