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The Workshop was organized to identify common challenges and solutions specific to photopolymers, ultraviolet curing, manufacturing processes, and the performance of materials in commercial products. The publication details “Overarching Challenges to Advancing PAM Technology” and offers “Recommended Roadmapped Research Directions” including for: Material science and engineering to characterize PAM materials; Advanced computing for materials discovery and process modelling; Measurement science and standards development for reliable, high-performance PAM; Environmental, health, and safety regulations for safe and responsible PAM adoption; and Opportunities for Industry collaborations to enhance PAM utility. NIST has been instrumental in the growth and development of U.S. technologies, and is at the forefront of the push into photopolymer additive manufacturing, building on ground-breaking work. Please visit the PAM event website for the workshop summary and complete workshop report.
Please also note, coming soon from NIST and RadTech: ThePAM workshop identified strong interest among multiple stakeholder groups to develop and disseminate PAM specific characterization methods–NIST and RadTech are organizing a 4-week seminar series that will provide a deep-dive each week on a specific class of characterization techniques (e.g. chemical spectroscopy, mechanical testing, advanced-microscopy).” Details coming soon.